APPARATUS, METHOD, AND SYSTEM FOR CLEANING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and technology for cleaning substrate which can use the space of in a factory effectively by reducing the installation area of the apparatus in the factory. SOLUTION: Two cleaning tank lines 12, 13 are arranged in the progress direction of a treatment process, and in order to immerse substrates in each cleaning tank all together in turn for cleaning, a substrate conveyance robot 15 is constituted to be removable in the progress direction of the treatment process and perpendicularly to the progress direction to reduce the installation space of the apparatus.