发明名称 Stand alone plasma vacuum pump
摘要 A stand-alone plasma vacuum pump for pumping gas from a low-pressure inlet to a high-pressure outlet, composed of: a housing enclosing one or more pumping regions located between the inlet and the outlet; a plurality of permanent magnet assemblies providing magnetic fields that extend in the pumping region between the inlet and the outlet, the magnetic field forming magnetic flux channels for guiding and confining plasmas; elements disposed for coupling microwave power into the flux channels to heat electrons, ionize gas, and accelerate plasma ions in a direction from the inlet to the outlet; elements disposed for creating an electric in the magnetic flux channels to accelerate ions in the flux channels toward the outlet by momentum transfer; and a differential conductance baffle proximate to the outlet for promoting flow of plasma ions and neutral atoms to the outlet while impeding flow of neutral gas molecules in a direction from the outlet toward the inlet.
申请公布号 AU5317401(A) 申请公布日期 2001.10.30
申请号 AU20010053174 申请日期 2001.04.06
申请人 TOKYO ELECTRON LIMITED 发明人 RAPHAEL A. DANDL;BILL H. QUON
分类号 H05H1/46;B01J3/02;H01J41/12;H01J41/18;H01L21/3065;H01L21/31;H05H1/14 主分类号 H05H1/46
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