| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning substrate treatment apparatuses to be free from foreign materials such as apparatuses for producing semiconductor, flat panel display, etc., and an inspection device, and the like. SOLUTION: In the method for cleaning substrate treatment apparatuses, a cleaning material of a heat resistant resin is carried into the apparatus and contacted with a place to be cleaned. Especially, the glass transition temperature of the heat resistant resin is at least 150 deg.C.
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