发明名称 |
Organic anti-reflective coating material and its preparation |
摘要 |
Polymers are provided having the following formulas I and II:Polymers of the present invention can be used to provide an anti-reflective coating (ARC) material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157 nm F2 lasers. The polymers contain chromophore substituents which exhibit sufficient absorbance at wavelengths useful for such submicrolithography process. The ARC prevents back reflection from the surface of or lower layers in the semiconductor devices and solves the problem of the CD being altered by the diffracted and reflected light from such lower layers.
|
申请公布号 |
US6309790(B1) |
申请公布日期 |
2001.10.30 |
申请号 |
US20000499873 |
申请日期 |
2000.02.07 |
申请人 |
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. |
发明人 |
JUNG MIN-HO;HONG SUNG-EUN;BAIK KI-HO |
分类号 |
C07C67/14;C07C69/00;C07C69/54;C07C69/657;C08F12/32;C08F18/16;C08F20/12;C08F20/14;C08F220/14;C08F220/18;C08F220/26;C08F220/28;C08F220/30;C08F220/32;C09D5/32;C09D5/33;C09D133/06;C09D133/14;C09K;G03C5/00;G03F7/00;G03F7/004;G03F7/11;H01L;H01L21/027;H01L21/31;H01L21/312;H01L21/314;H01L21/469;H01L23/29;(IPC1-7):G03F7/004 |
主分类号 |
C07C67/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|