发明名称 Semiconductor memory and method for manufacture thereof
摘要 A semiconductor memory which can secure the stability of data holding characteristics and data read/write characteristics for a tunnel diode having a small peak/valley ratio, and to provide a method for manufacturing such a semiconductor memory. The peak/valley ratio of a tunnel diode can be improved by arranging a tunnel insulating film on the bottom portion of the ground direct contact forming the tunnel diode; the resistance of high resistance load can further be increased by arranging a tunnel insulating film on the bottom portion of the storage node direct contact; and data holding characteristics can be improved while controlling the column current by setting the power voltage impressed to the high resistance load higher than the power voltage impressed to the bit line. Stable data read/write characteristics can be secured while controlling the column current by increasing drain resistance by utilizing the drain region side of the access transistor as a P--type active region, and by arranging a tunnel insulating film on the bottom portion of the bit-line direct contact.
申请公布号 US6310798(B1) 申请公布日期 2001.10.30
申请号 US20000513848 申请日期 2000.02.25
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 MORIMOTO RUI
分类号 G11C11/38;H01L21/8244;H01L27/10;H01L27/11;H01L29/88;(IPC1-7):G11C11/38;G11C11/40 主分类号 G11C11/38
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