ISOLATION VALUE DEVICE OF SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

PURPOSE: An isolation value device of a semiconductor manufacturing apparatus is provided to prevent a damage of a wafer by installing an isolation value device between a load lock and a process chamber. CONSTITUTION: A partition(30) is installed between a load lock region(20) and a process chamber region(70) in order to form an opening(36) and separate the load lock region(20) and the process chamber region(70). The opening(36) is formed at the partition(30). A wafer(60) is transferred between the load lock region(20) and the process chamber region(70) by the opening(36). A door operation portion(52) is combined with a door(50) for opening and shutting the opening(36). The door operation portion(52) is formed on an upper portion of the opening(36). The door(50) is moved to an upper direction of the partition(30). An inclined plate(40) is extended and formed to a lower portion of the partition(30) to the load lock region(20).