METHOD FOR FABRICATING COLOR FILTER OF SOLID STATE IMAGING DEVICE

摘要

PURPOSE: A method for fabricating a color filter of a solid state imaging device is provided to improve resolution by obtaining a balanced spectral characteristic of each color of a color filter layer. CONSTITUTION: A photo diode is formed on a light receiving portion(a) of a semiconductor substrate(10). A charge transfer area is formed on a charge transfer portion(b). A charge transfer electrode(12) is formed on the charge transfer area. A shielding layer(14) is formed on an array area except the light receiving portion(a). An insulating layer(16) is formed on the shielding layer(14). A pad(22) for transferring an electric signal is formed on a pad area. A planarization layer(18) is formed on the whole surface of the semiconductor substrate(10). A color filter layer(20) is formed on the planarization layer(18). A protective layer(24) is formed on the color filter layer(20). The pad(22) and a scribe line is exposed by etching the planarization layer(18) and the protective layer(24) partially. A photo-resist is applied on the protective layer(24). A micro lens(26) is formed by performing a patterning process and a flow process.