发明名称 |
METHOD AND APPARATUS FOR MANUFACTURING VERY SMALL STRUCTURE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for manufacturing a very small structure by which the very small structure having the excellent shape accuracy is manufactured. SOLUTION: A pattern substrate 31 having a plurality of thin films 30 on a substrate 1 via a releasing layer 2 and an opposing substrate 62 on an opposing stage 6 are disposed at a place where they don't face each other, and a surface of the opposing substrate 62 and a surface of the thin films 30 are irradiated with the Ar gas 7 to be cleaned. An x-y-θstage 9 is moved to implement the alignment so that the opposing substrate 62 faces the thin films 30 on the pattern substrate 31. The opposing stage 6 is lowered by a z-stage 60 to joint the opposing substrate 62 with the thin films 30. When the opposing stage 6 is elevated, the thin films 30 on the substrate 1 are transferred to the opposing substrate 62 side.
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申请公布号 |
JP2001295077(A) |
申请公布日期 |
2001.10.26 |
申请号 |
JP20000116019 |
申请日期 |
2000.04.18 |
申请人 |
FUJI XEROX CO LTD |
发明人 |
TAKAHASHI MUTSUYA;YAMADA TAKAYUKI |
分类号 |
B81C1/00;C23C26/00;C23C28/00;(IPC1-7):C23C28/00 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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