发明名称 METHOD AND APPARATUS FOR MANUFACTURING VERY SMALL STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus for manufacturing a very small structure by which the very small structure having the excellent shape accuracy is manufactured. SOLUTION: A pattern substrate 31 having a plurality of thin films 30 on a substrate 1 via a releasing layer 2 and an opposing substrate 62 on an opposing stage 6 are disposed at a place where they don't face each other, and a surface of the opposing substrate 62 and a surface of the thin films 30 are irradiated with the Ar gas 7 to be cleaned. An x-y-θstage 9 is moved to implement the alignment so that the opposing substrate 62 faces the thin films 30 on the pattern substrate 31. The opposing stage 6 is lowered by a z-stage 60 to joint the opposing substrate 62 with the thin films 30. When the opposing stage 6 is elevated, the thin films 30 on the substrate 1 are transferred to the opposing substrate 62 side.
申请公布号 JP2001295077(A) 申请公布日期 2001.10.26
申请号 JP20000116019 申请日期 2000.04.18
申请人 FUJI XEROX CO LTD 发明人 TAKAHASHI MUTSUYA;YAMADA TAKAYUKI
分类号 B81C1/00;C23C26/00;C23C28/00;(IPC1-7):C23C28/00 主分类号 B81C1/00
代理机构 代理人
主权项
地址