| 摘要 |
PURPOSE: A both-sides exposure system is provided, to reduce the total exposing time and to improve the exposing efficiency by allowing the exposing process to be performed on the both sides of a substrate continuously with a single light source. CONSTITUTION: The both-sides exposure system(1) comprises a first mask holding unit(23L) which holds a first exposure mask(55) used to expose the first surface of a substrate(P); a first processed product holding unit(21L) which can moves between the first exposure position in front of the first mask holding unit and the first home position where a unexposed substrate is installed; a second mask holding unit(23R) which holds a second exposure mask used to expose the second surface of a substrate(P); a second processed product holding unit(21R) which can moves between the second exposure position in front of the second mask holding unit and the second home position where a both-sides exposed substrate is released; a single light source(61); a light path selection photo system which connects the light path toward the first and second exposure positions selectively; and a processed product delivery units(75L, 75R) which delivers the substrate(P) to the second processed product holding unit(21R) to allow the second surface of the substrate to be exposed. |
