| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing an optical element by which an optical element that precisely exhibits designed optical characteristics can be produced, without having to accurately position a substrate in relation to a rotary stage, and to provide an exposure system. SOLUTION: In the method for producing an optical element, in which the images Im1-Im3 of patterns P1-P3 formed in a reticle R are transferred to the transfer surface of a substrate W put on a rotary stage 8 and prescribed processing is carried out, the extent of dislocation of the central position of the substrate from the center C1 of rotation of the rotary stage 8 is calculated. Then the images Im1-Im3 are transferred to the transfer surface of the substrate W while varying the relative position of the substrate W and the images Im1-Im3 according to the calculated extent of dislocation.
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