发明名称 MANUFACTURING METHOD OF TRANSPARENT GAS BARRIER FILM
摘要 PROBLEM TO BE SOLVED: To provide a plastic film having a metal oxide layer of high quality and excellent for a packing material and a gas shielding material by realizing stable evaporation even during high-speed vapor deposition using a metal oxide as a vapor deposition material. SOLUTION: When continuously manufacturing the plastic film having the metal oxide layer at least on one side by using an electron beam heating vacuum vapor deposition method, the vapor deposition material of the metal oxide is heated to implement the vapor deposition by scanning the electron beam in the film traveling direction in addition to scanning and heating the electron beam in the direction orthogonal to the film traveling direction.
申请公布号 JP2001295029(A) 申请公布日期 2001.10.26
申请号 JP20000106462 申请日期 2000.04.07
申请人 TOYOBO CO LTD 发明人 IZEKI SEIJI;SUZUKI SHINJI;OSHIMA TSUKASA;KUBOTA TAKAHIRO
分类号 C08J7/04;C23C14/08;C23C14/10;C23C14/20;C23C14/24;C23C14/30;(IPC1-7):C23C14/30 主分类号 C08J7/04
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