| 摘要 |
PROBLEM TO BE SOLVED: To provide an exhaust device having a reaction furnace in a chamber with the thermal expansion taken into consideration in the temperature change in the reaction furnace. SOLUTION: In the exhaust device 1, the reaction furnace 3 having a film deposition unit 4 and an exhaust unit 5 is provided in the chamber 2, a center portion 5-2 of an outer surface 5-1 of the exhaust portion is fixed to a center portion 2-2 of an inner surface 2-1 in the chamber facing the outer surface 5-1 of the exhaust unit via a fixing member 8, a slidably supporting portion 6 is formed on a center portion 5-4 of an outer surface 5-3 facing the exhaust unit facing the outer surface 5-1 of the exhaust unit, and a guide portion 7 is formed on a center portion 2-4 of an inner surface 2-3 in the chamber facing the side surface 2-1 in the chamber. The slidably supporting unit is slidable in the longitudinal direction (X-Y direction) along the guide portion according to the thermal expansion of the chamber and the reaction furnace, and the thermal expansion of the reaction furnace in the horizontal direction (Y-Y direction) is divided into two in the longitudinal direction.
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