发明名称 SURFACE-POTENTIAL MEASURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a surface-potential measuring apparatus by which the surface potential in the very small part of a sample having a high potential can be measured. SOLUTION: In the surface-potential measuring apparatus, piezoelectric pulses at a frequency corresponding to the natural frequency of a probe 14 are given to a piezoelectric element 12, and the probe 14 is vibrated in the transverse direction. A Z-direction controller 182 drives and controls a Z-direction movement device 16Z so as to bring the probe 14 close to the sample 36. The probe 14 is irradiated with a laser beam by a laser light source 32. In a PC 28, vibration information on the laser beam is obtained from a photodiode 44, and the vibration state of the probe 14 is detected. The probe 14 is brought close to the surface of the sample 36, a shear force acts on the probe 14, and the vibration of the probe 14 is damped. While its position is used as a reference point, the distance between the sample 36 and the probe 14 is controlled.
申请公布号 JP2001296323(A) 申请公布日期 2001.10.26
申请号 JP20000115714 申请日期 2000.04.17
申请人 FUJI XEROX CO LTD 发明人 YONEYAMA HIROTO;YAMAZAKI KAZUO;NUKADA KATSUMI
分类号 G01R29/12;G03G5/00;G03G21/00;(IPC1-7):G01R29/12 主分类号 G01R29/12
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