| 摘要 |
PROBLEM TO BE SOLVED: To obtain a sputtering target for deposition of optical disk protective film, capable of increasing the uniformity of film and enhansing productive efficiency by improving powder as material for target and enabling DC sputtering using the resultant target. SOLUTION: The sputtering target for optical disk protective film is constituted of a sintered compact composed essentially of powder prepared by coating one or more ceramic powders selected from those of oxide, nitride, carbide, boride, sulfide and silicide with metal or alloy or mixing this metal or alloy on the above one or more ceramic powders. |
