| 摘要 |
PROBLEM TO BE SOLVED: To obtain a method of exposure and an aligner by which a high- resolution pattern can be formed in an arbitrary shape by double exposure consisting of exposure of periodic patterns and normal pattern exposure. SOLUTION: Several mask patterns having different patterns are composed by an optical composition member and the same region on a wafer surface is scanned and exposed through the several mask patterns in sequence or simultaneously and in the same way by a projection optical system with synchronism between the several mask patterns and the wafer. |
