发明名称 METHOD AND APPARATUS FOR INSPECTION OF DEFECT
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus, for the inspection of a defect, in which a quality can be decided with reference to a precision pattern which is hardly detected optically such as a pattern which is created by a transparent metal film conductor, the inner-layer pattern of a multilayer printed-wiring board or the like. SOLUTION: A DC potential is applied to one end of a conductive pattern. A detecting electrode is made to face the other end of the conductive pattern. A change in a capacitance which is formed across the detecting electrode and the conductive pattern is detected electrically. Thereby, the conductive pattern is inspected.
申请公布号 JP2001296326(A) 申请公布日期 2001.10.26
申请号 JP20000116180 申请日期 2000.04.18
申请人 ODP:KK 发明人 YAMAMOTO SHIGERU
分类号 G01R31/02;H01L21/66;(IPC1-7):G01R31/02 主分类号 G01R31/02
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