| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target for deposition of a seed layer, with which the size of magnetic particles in a magnetic film can be refined and simultaneously the size of the magnetic particles can be uniformized, and its manufacturing method. SOLUTION: The sputtering target contains CoO crystal grains and crystal grains of divalent to tetravalent oxides, and respective crystal grains gather densely and are uniformly mixed and dispersed. This sputtering target can be manufactured by selecting CoO powder and at least one or more kinds among powder of Si oxide, such as SiO2 and SiO, powder of Ti oxide, such as TiO2, Ti2O3 and TiO3, powder of Ca oxide, such as CaO and CaO2, and powder of zinc oxide such as ZnO and subjecting these powders to ball mill kneading, drying, compacting and sintering.
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