发明名称 SUPERCRITICAL FLUID DELIVERY AND RECOVERY SYSTEM FOR SEMICONDUCTOR WAFER PROCESSING
摘要 <p>A continuous flow, steady state fluid delivery and recovery system for a process chamber and processes requiring supercritical fluid and desired additives including co-solvents, for conducting repetitive batch processing operations in an automated environment, for such processes as supercritical carbon dioxide cleaning and processing of semiconductor wafers. The system provides for steady-state operation of fluid flow and byproducts recovery while the process chamber is brought rapidly and repeatedly on and off line as in batch operations and for various process steps.</p>
申请公布号 WO2001078911(A1) 申请公布日期 2001.10.25
申请号 US2001012617 申请日期 2001.04.18
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