| 发明名称 |
Abatement of semiconductor processing gases |
| 摘要 |
A method for the abatement of one or more pyrophoric gases in a gas stream, which comprises introducing water in to the gas stream and/or mixing the gas stream with preheated air and introducing the gas stream in to a container in which the pyrophoric gases are abated.
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| 申请公布号 |
US2001032543(A1) |
申请公布日期 |
2001.10.25 |
| 申请号 |
US20010796846 |
申请日期 |
2001.03.01 |
| 申请人 |
SEELEY ANDREW JAMES;SMITH JAMES ROBERT |
发明人 |
SEELEY ANDREW JAMES;SMITH JAMES ROBERT |
| 分类号 |
B01D53/34;B01D53/46;B01D53/68;B01D53/70;C23C16/44;H01L21/205;(IPC1-7):B01D47/06 |
主分类号 |
B01D53/34 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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