| 发明名称 |
Optical apparatus, exposure apparatus, and exposure method |
| 摘要 |
The present invention provides optical apparatus 17 wherein a thin film 22 with an optical characteristic having wavelength dependence is formed on an optical surface, which comprises a suppressor 20 for suppressing the wavelength dependence in a predetermined wavelength band.
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| 申请公布号 |
US2001033490(A1) |
申请公布日期 |
2001.10.25 |
| 申请号 |
US20010836430 |
申请日期 |
2001.04.18 |
| 申请人 |
KOYAMA MOTOO;KATO MASAKI;SHIBANO HIDEFUMI |
发明人 |
KOYAMA MOTOO;KATO MASAKI;SHIBANO HIDEFUMI |
| 分类号 |
G03F7/20;F21V9/00;G02B1/10;G02B1/11;G02B27/00;G03B27/42;G03B27/54;H01L21/027;(IPC1-7):F21V9/00 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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