| 摘要 |
<p>A windowless system and apparatus are provided that prevent outgases form contaminating the projection optics of an in-vacuum lithography system (100). The outgassing mitigation apparatus (124) comprises a chimney (304) that is substantially closed at one end, a duct fluidly coupled to the chimney, and a baffle (602) disposed within the chimney. The chimney of the outgassing mitigation apparatus is funnel shaped (402) at the end that is substantially closed. This end of the chimney has an opening that permits a beam or bundle of light to pass through the chimney. A rotating barrier (902), having at least one aperture for the passage of light, can be positioned near the chimney so that the rotating barrier substantially closes an open end of the chimney except when one of the apertures of the rotating barrier is passing by the chimney. This rotating barrier can be chilled by a refrigerator unit (906), which is radiantly coupled to a portion of the rotating barrier. A motor (904) is used to rotate the barrier. A light source synchronization module (910) is used to trigger a pulsed light source while the apertures of the rotating barrier are aligned with the chimney of the outgassing mitigation apparatus. Moreover, a barrier gas (911) system can be used to inject a barrier gas into the chimney.</p> |
