发明名称 Positive-working radiation-sensitive composition
摘要 A positive-working radiation-sensitive composition containing a resin having an acid-decomposing group having a specific acetal structure, and being decomposed by the action of an acid to increase the solubility thereof in an alkali developer; a compound generating an acid by the irradiation of an active light or radiation and contributes to the decomposition reaction of the acid-decomposing group of the resin; a compound generating an acid by the irradiation of an active light or radiation but does not contribute to the decomposition reaction of the acid-decomposing group of the resin; a surface active agent, and a solvent.
申请公布号 US2001033993(A1) 申请公布日期 2001.10.25
申请号 US20000748198 申请日期 2000.12.27
申请人 KANNA SHINICHI;KODAMA KUNIHIKO 发明人 KANNA SHINICHI;KODAMA KUNIHIKO
分类号 G03F7/004;G03F7/039;(IPC1-7):G03F7/039 主分类号 G03F7/004
代理机构 代理人
主权项
地址