发明名称 |
Positive-working radiation-sensitive composition |
摘要 |
A positive-working radiation-sensitive composition containing a resin having an acid-decomposing group having a specific acetal structure, and being decomposed by the action of an acid to increase the solubility thereof in an alkali developer; a compound generating an acid by the irradiation of an active light or radiation and contributes to the decomposition reaction of the acid-decomposing group of the resin; a compound generating an acid by the irradiation of an active light or radiation but does not contribute to the decomposition reaction of the acid-decomposing group of the resin; a surface active agent, and a solvent.
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申请公布号 |
US2001033993(A1) |
申请公布日期 |
2001.10.25 |
申请号 |
US20000748198 |
申请日期 |
2000.12.27 |
申请人 |
KANNA SHINICHI;KODAMA KUNIHIKO |
发明人 |
KANNA SHINICHI;KODAMA KUNIHIKO |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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