发明名称 DEFECT REDUCTION IN GAN AND RELATED MATERIALS
摘要 <p>A material with reduced surface defects includes a defect filter layer (3) on an underlying material (2). The defect filter (3) reduces dislocations and defects present in an underlying material (2). The defect filter (3) includes islands of one material formed on the underlying layer (2) and a continuous layer of a second material over the islands. The pair of layers is repeated a plurality of times to reduce the number of defects emanating from the underlying material (2).</p>
申请公布号 WO2001080311(A1) 申请公布日期 2001.10.25
申请号 US2001012329 申请日期 2001.04.16
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