发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR CONTROLLING THE OPERATING CONDITION PARAMETER
摘要 <p>A semiconductor manufacturing apparatus is improved so that apparatus operating condition parameters can be restored to setting values of various levels such as standard, apparatus delivery time or client oriented setting values even if the parameters are overwritten. The semiconductor manufacturing apparatus is constituted by a multi-chamber processing system 4, a transport system 8 of an object and an equipment control unit 210 having a memory apparatus 214 storing the apparatus operating condition parameters and providing the parameters to machine control units 150, 72. The machine control units 150, 72 controls the processing system 4 and the transport system 8 based on the apparatus operating condition parameters. The equipment control system 210 stores the apparatus operating condition parameters in the memory apparatus 214 for each level provided with a priority level from a standard level peculiar to the apparatus to a specific level peculiar to a user, and the equipment control system 210 develops the apparatus operating condition parameters stored in the memory apparatus on a memory 210 of the machine control units 150, 72 in an order of priority levels. <IMAGE></p>
申请公布号 EP1148402(A1) 申请公布日期 2001.10.24
申请号 EP20000953556 申请日期 2000.08.22
申请人 TOKYO ELECTRON LIMITED 发明人 NAGATA, MASAYA;SUGAWARA, MASAHIRO
分类号 B23Q41/08;G05B19/418;H01L21/00;H01L21/02;(IPC1-7):G05B19/418 主分类号 B23Q41/08
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