Method of manufacturing an optical waveguide substrate

摘要

A method of making a high quality optical waveguide substrate is provided, in which the surface of a silicon substrate is oxidized through relatively large thickness and no foreign matter particles are adhered on the surface thereof. The silicon substrate to form a quartz film for the optical waveguide is mounted on a carbon contained ceramics sample base and is inserted into a carbon contained ceramics furnace core tube of which its external circumference is arranged in a heating furnace. When the inside of the furnace core tube is heated to 200 to 600 DEG C by the heating furnace, an oxidant gas for the silicon substrate surface is introduced, then by further heating up to 1200 to 1350 DEG C, the silicon surface is thus oxidized. <IMAGE>