发明名称 ArF EXCIMER LASER DEVICE, KrF EXCIMER LASER DEVICE AND FLUORINE LASER DEVICE
摘要 PURPOSE: To provide an ArF excimer laser device in which the half value full width of a pulse width can be 20 ns or less, the continuing time of a pulse can be 50 ns or more, and the half value full width of spectrum width can be 0.35 pm or less, and to provide a KrF excimer layer device in which the pulse can be made longer than a conventional manner and a fluorine laser device. CONSTITUTION: This ArF excimer layer device has a pair of laser discharge electrodes connected to the output edge of a magnetic pulse compressing circuit and arranged in a laser chamber, and a peaking capacitor connected in parallel to the pair of laser discharge electrodes. The output waveform of a laser pulse is obtained as a two mountain-shaped waveform constituted of a first half peak p1 and the second half peak p2. When the peak value of the first half peak p1 is set as P1, and the peak value of the second half peak p2 is set as P2, and (the rate of the pulse second half)=P2/(P1+P2)x100(%), (the rate of the pulse second half) can be 50% or more in this ArF excimer laser device.
申请公布号 KR20010092364(A) 申请公布日期 2001.10.24
申请号 KR20010013359 申请日期 2001.03.15
申请人 USHIO RESEARCH INSTITUTE OF TECHNOLOGY INC. 发明人 KAKIZAKI KOJI;TADA AKIHUMI
分类号 H01S3/097;H01S3/0977;H01S3/225;(IPC1-7):H01S3/225 主分类号 H01S3/097
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