Composition for film formation, method of film formation, and silica-based film

摘要

A composition for film formation which comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one compound selected from the group consisting of (A-1) compounds represented by the following formula (1) RaSi(OR<1>)4-a (A-2) compounds represented by the following formula (2) Si(OR<2>)4 and (A-3) compounds represented by the following formula (3) R<3> b (R<4>O) 3-bSi-(R<7>)d-Si (OR<5>)3-cR<6> c (B) at least one member selected from the group consisting of compounds of the metals in Groups IA and IIA of the periodic table; and (C) an organic solvent. A method for film formation using the composition and a silica-based film obtained by the method are also disclosed.