| 摘要 |
<p>A method for the production of multi-layer systems with N layers having predetermined thickness, especially for the production of multi-layer systems for wavelength ranges in the extreme ultraviolet and soft X-ray wavelength range is described, in which N layers are deposited and if need be one or more layers are partially removed after deposited and in wich at the same time as deposition and/or removal of layers, the layers' reflectivity dependent on layer thickness is measured. The method includes the following steps: Calculation of a reflectivity-time curve of the multi-layer system to be produced Determination of points in time ti (i = 1, 2, .., N), at which the deposition of the i-th layer is to be stopped; and if need be determination of points in time ti' (i = 1, 2, ..., N), at which the partial removal of the i-th layer is to be stopped, and at which the reflectivity at ti or ti' is in the range of a turning point of the reflectivity-time curve; Calculation of parameters ki (i = 1,2,..., N) for deposition and if need be ki' (i = 1,2,..., N) for partial removal, Deposition of the first layer with simultaneous reflectivity measurement; and calculation of the current parameter kc/i based on intensities of the reflectivity measurement; Stopping of the deposition as soon as kc/i = ki; and if need be partial removal of the first layer with simultaneous reflectivity measurement and calculation of the current parameter kc'/i based on intensities of the reflectivity measurement; Stopping of the partial removal as soon as kc'i = ki; Repetition of the previous steps for all subsequent layers up to and including layer N.</p> |
