| 摘要 |
A Group III-V complex vertical cavity surface emitting laser (VCSEL) diode manufactured using GaN-system III-V nitride, and a method of manufacturing the same, are provided. The Group III-V complex surface emitting laser diode can obtain a sufficient reflectance even with a small number of pairs of a distributed bragg reflector (DBR), by forming DBRs including air layers. Thus, the crystal growth problem is solved. Also, current confinement and waveguiding are realized by AIN lateral oxidation or etching.
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