APPARATUS AND METHOD FOR PHOTO-ETCHING AND METHOD OF MANUFACTURING TFT SUBSTRATE FOR LCD DEVICE USING THE SAME

摘要

PURPOSE: An apparatus and a method for photo-etching and a method for manufacturing a TFT substrate for an LCD device using the same are provided to improve the productivity in an etching process by using two exposure devices simultaneously. CONSTITUTION: A thin film(20) is formed on a substrate(10) by using a CVD(Chemical Vapor Deposition) method or a sputtering method, and a coating method. A positive photoresist layer is formed thereon. The first exposure process is performed by using the first mask with a transparent substrate formed with the first pattern. The second exposure process is performed by using the second mask. The second pattern is formed on the second mask. The second pattern is the same pattern as the pattern of the first mask or a pattern different from the pattern of the first mask. The thickness of a photo-resist layer(31,32) is controlled by performing a development process. The photo-resist patterns having different thickness are formed by performing two exposure process.