发明名称 MANUFACTURING METHOD OF CERAMIC MEMBER FOR HOLDING WAFER
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a wafer holding ceramic member adequate for a conveying/holding member of a semiconductor wafer, an LCD glass substrate, a magnetic disk substrate and the like. SOLUTION: In this manufacturing method of the wafer holding ceramic member, a projection is formed at a predetermined position of a ceramic substrate by a sandblast machining method, and the edge of the tip of the projection is finished like curved surface. The edge of the tip of the projection is polished using a brush holding abrasive grains on the surface or inside the bristles to be finished like curved surface.
申请公布号 JP2001293650(A) 申请公布日期 2001.10.23
申请号 JP20000115863 申请日期 2000.04.12
申请人 HITACHI CHEM CO LTD 发明人 SHIMODA SHUICHIRO;IWAI AKIHITO
分类号 B24B29/00;(IPC1-7):B24B29/00 主分类号 B24B29/00
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