发明名称 Method for etching multilayer compound semiconductor material
摘要 A multilayer compound semiconductor is contacted with an electrically conducting fluid, and a current is passed between the semiconductor and the fluid. The current passes is monitored, and the current is controlled in response to the monitoring.
申请公布号 US6306674(B1) 申请公布日期 2001.10.23
申请号 US20000571468 申请日期 2000.05.16
申请人 ZORY, JR. PETER S. 发明人 ZORY, JR. PETER S.
分类号 C25D11/32;H01L21/3063;H01L21/316;H01L21/465;H01L21/471;(IPC1-7):H01L21/00 主分类号 C25D11/32
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