| 摘要 |
PURPOSE: An ESC(electrostatic chuck) is provided to prevent the damage of the ESC due to a plasma by minimizing edge portions of a wafer exposed to the plasma. CONSTITUTION: The ESC comprises a main body(60) having a mounting surface(63) for loading a wafer(80), wherein the diameter of the mounting surface(63) corresponds to the diameter of the wafer(80) so as to minimize edge portions of the wafer exposed to a plasma, and a focus ring(70). The main body(60) further includes an anode oxide(66) made of an aluminum, an electrode plate(62) formed on the anode oxide(66), a dielectric film(64) formed on the electrode plate(62), and a side dielectric film(68) formed at both sides of the main body(60) and connected to the dielectric film(64) for preventing a damage of the main body(60) due to the plasma.
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