发明名称 |
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same |
摘要 |
The invention includes polymers that contain a heterocyclic ring, preferably an oxygen- or sulfur-containing ring. The heterocyclic ring is preferably fused to the polymer backbone. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.
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申请公布号 |
US6306554(B1) |
申请公布日期 |
2001.10.23 |
申请号 |
US20000567634 |
申请日期 |
2000.05.09 |
申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
BARCLAY GEORGE G.;YUEH WANG |
分类号 |
C08F220/10;C08F220/18;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 |
主分类号 |
C08F220/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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