发明名称 SEMICONDUCTOR DEVICE, SUBSTRATE FOR OPTOELECTRONIC DEVICE, SUBSTRATE FOR LIQUID CRYSTAL DEVICE, ITS MANUFACTURING METHOD, LIQUID CRYSTAL DEVICE, AND PROJECTION LIQUID CRYSTAL DISPLAY DEVICE AND ELECTRONIC EQUIPMENT USING THE LIQUID CRYSTAL DEVICE
摘要 PURPOSE: To provide a means to securely prevent a crack and peeling of an insulating film in the periphery of a disconnection part at disconnection of a wiring for a short circuit by etching in substrates for various electronic equipment, such as the substrate for liquid crystal device subjected to a countermeasure against the static electricity by the wiring for the short circuit. CONSTITUTION: In the substrate for liquid crystal device, a hole for cutting 37 for cutting the wiring 33 for the short circuit by etching is provided in a first interlayer insulating film 21 and a second interlayer insulating film 22 which cover the wiring 33 for the short circuit as a static electricity countermeasure wiring. An etching stop layer 38 consisting of a single crystal silicon film having resistance to etching of the second interlayer dielectric 22 is formed over a wider region than the hole for cutting 37 between the wiring 33 for the short circuit and an embedded oxidized film 62.
申请公布号 KR20010091977(A) 申请公布日期 2001.10.23
申请号 KR20010012576 申请日期 2001.03.12
申请人 SEIKO EPSON CORPORATION 发明人 HIRABAYASHI YUKIYA
分类号 G02F1/13;G02F1/1333;G02F1/136;G02F1/1362;G02F1/1368;G09F9/00;G09F9/30;H01L21/3205;H01L23/52;H01L29/786;(IPC1-7):G02F1/136 主分类号 G02F1/13
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