CARBON BLACK FOR ANTIREFLECTION FILM

摘要

PROBLEM TO BE SOLVED: To provide a carbon black suitable for use in the formation of an antireflection film used in a photoresist process. SOLUTION: The carbon black for an antireflection film has a crystalline state having >=2.0 nm crystallite size Lc(002) and a grain aggregated state having 20-50 nm Stokes mode diameter Dst of aggregates.