发明名称 LINE TYPE FILM DEPOSITING METHOD, AND REFLECTOR FORMED BY THE METHOD
摘要 PROBLEM TO BE SOLVED: To realize a series of steps by setting an aluminum vapor deposition film depositing step and a plasma polymerized film depositing step in a line, and to prevent a protective film (a silicone polymerized film) from being formed on a back side of a reflector base material. SOLUTION: Aluminum vapor deposition films 401 (401a, 401b) and a silicone plasma polymerized film (protective film) 501 are deposited on synthetic resin base materials 2 by successively moving a case 1 with a plurality of synthetic resin base materials 2 arranged and accommodated inside an aluminum vapor deposition chamber 4 and a plasma polymerized film deposition chamber 5 which are arranged in a line, and a reflector 10 obtained thereby is mounted on a discharge head lamp 7.
申请公布号 JP2001288570(A) 申请公布日期 2001.10.19
申请号 JP20000098858 申请日期 2000.03.31
申请人 KOITO MFG CO LTD 发明人 INABA TERUAKI
分类号 F21S8/10;C23C14/20;C23C14/56;F21V7/00;F21V7/22;F21V17/00;G02B1/10;(IPC1-7):C23C14/56 主分类号 F21S8/10
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