| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for removing a photoresist which ensures low dangerousness in work, can reduce cost for a ventilation equipment, etc., hardly affects the environment but increases the rate of removal. SOLUTION: The method for removing a photoresist includes a decomposition step where solvent molecule-containing wet ozone being an ozoized gas containing solvent molecules is brought into contact with a photoresist present on the surface of a substrate 1 and a washing step where the surface of the substrate 1 is washed with a photoresist removing liquid which dissolves the photoresist.
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