| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad having high polishing speed and stabilized polishing characteristics and strong against scratching, and to provide a method of production. SOLUTION: The polishing pad comprises a resin composition, where a plurality of micropolymer elements are dispersed into an acryl based resin. The polishing pad is produced by molding a resin composition, where a plurality of micropolymer elements are added and dispersed into an acryl based resin, containing at least an acryl based monomer or molten acryl based resin. |
