发明名称 METHOD FOR MEASURING ABERRATION IN OPTICAL IMAGE FORMING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide an improved method and a device for detecting aberrations in an optical projection system. SOLUTION: This method includes a step for measuring one or more parameters, such as the best focus position and (or) a lateral direction position of an image formed by an image-forming system. The measurement is repeated relative to plural various radiation settings of the image forming system, and one or more coefficients showing the aberration of the image forming system is calculated from the measurement.
申请公布号 JP2001289735(A) 申请公布日期 2001.10.19
申请号 JP20010045353 申请日期 2001.02.21
申请人 ASM LITHOGRAPHY BV 发明人 VAN DER LAAN HANS;MOERS MARCO HUGO PETRUS
分类号 G01M11/02;G02B13/24;G03F7/20;H01L21/027;(IPC1-7):G01M11/02 主分类号 G01M11/02
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