发明名称 |
METHOD FOR MEASURING ABERRATION IN OPTICAL IMAGE FORMING SYSTEM |
摘要 |
PROBLEM TO BE SOLVED: To provide an improved method and a device for detecting aberrations in an optical projection system. SOLUTION: This method includes a step for measuring one or more parameters, such as the best focus position and (or) a lateral direction position of an image formed by an image-forming system. The measurement is repeated relative to plural various radiation settings of the image forming system, and one or more coefficients showing the aberration of the image forming system is calculated from the measurement.
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申请公布号 |
JP2001289735(A) |
申请公布日期 |
2001.10.19 |
申请号 |
JP20010045353 |
申请日期 |
2001.02.21 |
申请人 |
ASM LITHOGRAPHY BV |
发明人 |
VAN DER LAAN HANS;MOERS MARCO HUGO PETRUS |
分类号 |
G01M11/02;G02B13/24;G03F7/20;H01L21/027;(IPC1-7):G01M11/02 |
主分类号 |
G01M11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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