EQUIPMENT FOR MANUFACTURING PROCESSING TUBE INCLUDING SLIT-TYPE PROCESS GAS INLET AND WASTE GAS EXHAUST OF POROUS STRUCTURE, AND EQUIPMENT FOR MANUFACTURING SEMICONDUCTOR ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing process tube capable of forming a thin film at a high speed, keeping it uniform in film quality and preventing particles from being produced when a thin film is formed by the use of a wafer of large diameter. SOLUTION: Belt-like recessed parts cut in the first part of a cylindrical tube main body prescribed in wall thickness in the circumferential direction are provided in a vertical direction, slit-like process gas inlets capable of feeding process gas are provided on the bottoms of the recessed parts, waste gas exhausts capable of exhausting waste gas after processing is finished are provided in a vertical direction on the second side of the cylindrical tube main body opposed to the gas inlets, and the process gas inlets and the waste gas exhausts are provided in one piece inside the process tube main body.