发明名称 SEMICONDUCTOR ELEMENT HAVING PATTERN FOR MEASURING RESISTANCE OF CONDUCTIVE PLUG AND PROCESS EVALUATION METHOD
摘要 PROBLEM TO BE SOLVED: To enable to accurately detect the amount of the positional deviation of through holes and the direction of the positional deviation of the through holes from a change in the resistance value of a pattern array for measuring the resistance of conductive plugs arranged in the interior of a TEG. SOLUTION: A conductive plug array 12 is arranged along the four sides of a TEG 11. Each conductive plug 15 of the cross-sectional form of almost a rectangle is connected between each upper Al wiring layer 14 and each lower Al wiring layer 13, but the plug 15 is formed in such a way that the half length of the plug 15 squeezes out from the layer 13. When the plug 15 causes a positional deviation in the horizontal direction, the area of the contact of the layer 13 with the plug 15 is increased and decreased. With that, the measured resistance value of the plug array 12 is increased and decreased. At the amount of change of these increased and decreased values from the reference value, the direction and magnitude of the positional deviation of through holes can be known.
申请公布号 JP2001291754(A) 申请公布日期 2001.10.19
申请号 JP20000104341 申请日期 2000.04.06
申请人 NEC CORP 发明人 NISHIDE MAKOTO
分类号 H01L21/66;H01L21/3205;H01L23/52;(IPC1-7):H01L21/66;H01L21/320 主分类号 H01L21/66
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