POSITIVE PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive photoresist composition having satisfactory sensitivity and resolving power and excellent in PED stability in the formation of a contact hole pattern in the production of a semiconductor device. SOLUTION: The positive photoresist composition contains a resin containing specified silicon-containing repeating units and repeating units each having a specified acid decomposable group and having solubility in an alkali developing solution increased by the action of an acid and a compound which generates the acid when irradiation with active light or radiation.