| 摘要 |
PROBLEM TO BE SOLVED: To provide a simple developing method which suppress the generation of particles on a substrate to the utmost when the substrate having an exposed resist layer on the main surface thereof is mounted on a turntable and the development of the resist layer is performed. SOLUTION: This developing method has a process which feeds a developer onto the main surface of the substrate and performs the developing of the said resist layer, a process which thereafter stops the feed of developer and removes the developer by rotating the substrate and a process which feeds rinsing liquid onto the main surface of the substrate deprived of the developer and performs rinsing processing of the resist layer. As a result, the satisfactory results are obtained using such a simple method that the developer is removed by rotating the substrate after the developing prior to the feeding of the rinsing liquid. |
