| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a pellicle consisting of a high performance pellicle film and a pellicle frame which prevents the deviation in an optical path caused by the bending of a glass sheet as the pellicle film due to the own-weight and, as a result, exerts no adverse effect on resolution of lithography. SOLUTION: This pellicle for lithography and mitigating method of warp of pellicle film is featured in that the glass sheet is used as the pellicle film of the pellicle for lithography, the warp is previously formed in the glass sheet and the glass sheet is stuck to the pellicle frame in such a manner that the concave face of the glass sheet is faced upward.</p> |
