WAFER FAULT INSPECTION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a wafer fault inspection device which can inspect the wafer fault at a very high speed regardless of the size, position and pattern of the wafer. SOLUTION: This inspection device consists of a rotary stage 3 where plural wafers are mounted, a photographing means 4 which emits a beam on the stage 3 and photographs the swath images of the wafers and an image comparison means 5 which performs comparison among the wafer images which are photographed by the means 4.