发明名称 BEAM HOMOGENIZER AND LASER IRRADIATOR, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To solve the problem of a linear laser beam, having uniform energy used in the annealing process of an amorphous semiconductor film where a long linear laser beam is required for mass production, a very expensive optical lens is required for forming a linear laser beam of 600 mm or longer by using the conventional transmission type optical system, and the length of 600 mm corresponds to the length of one side of a large substrate for mass production. SOLUTION: The problem is solved by using an optical system comprising reflectors shown in Fig. 1. When beam splitting reflectors 1106 and 1107 are used, a linear laser beam having uniform energy can be formed through an arrangement consisting only of reflectors. The reflector can be machined very easily, as compared with a transmission type lens and can be manufactured very inexpensively in case of a large scale optical system. When the optical system is employed, a linear laser beam of 600 mm or longer can be formed relatively easily.</p>
申请公布号 JP2001291681(A) 申请公布日期 2001.10.19
申请号 JP20010024659 申请日期 2001.01.31
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 TANAKA KOICHIRO
分类号 G02F1/1368;H01L21/20;H01L21/268;H01L21/336;H01L29/786;H01S3/00;(IPC1-7):H01L21/268;G02F1/136 主分类号 G02F1/1368
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