发明名称 |
REDUCED COHERENCE SYMMETRIC GRAZING INCIDENCE DIFFERENTIAL INTERFEROMETER |
摘要 |
A system for inspecting specimens such as semiconductor wafers is provided. The system provides scanning of dual-sided specimens (111) using a diffraction grating (153) that widens and passes nth order (n > 0) wave fronts to the specimen surface and a reflective surface (154,155) for each channel of the light beam. Two channels and two reflective surfaces are preferably employed, and the wavefronts are combined using a second diffraction grating (156) and passed to a camera system (159a,b) having a desired aspect ratio.
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申请公布号 |
WO0177612(A1) |
申请公布日期 |
2001.10.18 |
申请号 |
WO2001US10946 |
申请日期 |
2001.04.04 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
MUELLER, DEITER;KAVALDJIEV, DANIEL, IVANOV;SCHIERLE, RAINER |
分类号 |
G01B9/02;G01B11/06;G01B11/30;(IPC1-7):G01B9/02 |
主分类号 |
G01B9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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