发明名称 Ceramic heater device and film forming device using the same
摘要 A ceramic cover plate is placed on the surface of a heater typically consisting of a ceramic heater used in a CVD device so as to cover the entire heating surface of the heater, and a silicon wafer 2 is placed on a recessed supporting surface 2a defined by the surface of the cover plate 2. The surface of the ceramic heater is therefore protected by the cover made of a ceramic plate, and the surface of the ceramic heater is prevented from being directly exposed to the gas such as the cleaning gas. Because the corrosion caused by the cleaning gas is limited to the cover, the ceramic heater can be renewed simply by replacing the cover. This substantially reduces the cost for the maintenance work.
申请公布号 US2001029895(A1) 申请公布日期 2001.10.18
申请号 US20010814277 申请日期 2001.03.21
申请人 NHK SPRING CO., LTD. 发明人 HANAMACHI TOSHIHIKO;TACHIKAWA TOSHIHIRO;FUKUDA HIDEAKI
分类号 H05B3/20;C23C16/458;C23C16/46;H01L21/00;H01L21/31;H05B3/10;H05B3/18;(IPC1-7):C23C16/00 主分类号 H05B3/20
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