发明名称 |
Ceramic heater device and film forming device using the same |
摘要 |
A ceramic cover plate is placed on the surface of a heater typically consisting of a ceramic heater used in a CVD device so as to cover the entire heating surface of the heater, and a silicon wafer 2 is placed on a recessed supporting surface 2a defined by the surface of the cover plate 2. The surface of the ceramic heater is therefore protected by the cover made of a ceramic plate, and the surface of the ceramic heater is prevented from being directly exposed to the gas such as the cleaning gas. Because the corrosion caused by the cleaning gas is limited to the cover, the ceramic heater can be renewed simply by replacing the cover. This substantially reduces the cost for the maintenance work.
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申请公布号 |
US2001029895(A1) |
申请公布日期 |
2001.10.18 |
申请号 |
US20010814277 |
申请日期 |
2001.03.21 |
申请人 |
NHK SPRING CO., LTD. |
发明人 |
HANAMACHI TOSHIHIKO;TACHIKAWA TOSHIHIRO;FUKUDA HIDEAKI |
分类号 |
H05B3/20;C23C16/458;C23C16/46;H01L21/00;H01L21/31;H05B3/10;H05B3/18;(IPC1-7):C23C16/00 |
主分类号 |
H05B3/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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