发明名称 |
Nonvolatile memory device and manufacturing method therefor |
摘要 |
A nonvolatile memory device and a manufacturing method therefor are provided. The nonvolatile memory device includes source pad lines connecting source regions of neighboring cells, parallel to word lines. Thus, the number of common source lines necessary for the overall cell array area can be reduced. Also, the distance between a word line and a contact hole is minimized by providing self-aligned bit line contact holes, thereby minimizing the size of a cell array area.
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申请公布号 |
US2001031524(A1) |
申请公布日期 |
2001.10.18 |
申请号 |
US20010882153 |
申请日期 |
2001.06.14 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM JONG-HAN;CHOI JEONG-HYUK |
分类号 |
H01L21/8247;H01L27/105;(IPC1-7):H01L21/823;H01L21/336 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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